| 摘要 |
An imaging optical system, a projection exposure equipment for microlithography containing the system, and a method for preparing a microstructure component by using the equipment are provided to allow a mirror to be manufactured more simply with a predetermined size. An imaging optical system(6) comprises a plurality of mirrors(M1 to M6) which images the object field placed on an object plane(4) at an image field placed on an image plane(8), wherein at least one mirror has a penetration hole(23) for imaging light(3), and the reflection surface of at least one mirror has the surface of a free form which cannot be explained by rotation symmetric function. Preferably the image plane is parallel to the object plane. |
