METHOD OF LOADING A SUBSTRATE ON A SUBSTRATE TABLE, DEVICE MANUFACTURING METHOD, COMPUTER PROGRAM, DATA CARRIER AND APPARATUS

摘要

The invention relates to a method of loading a first object on a second object in a lithographic apparatus. The method comprises: a) loading the first object on the second object, b) waiting an amount of time and c) performing a relaxation action. The first object may be a substrate and the second object a substrate table. The first object may also be a substrate table and the second object a support structure, supporting the substrate table.