发明名称 |
Near-field photomask and near-field exposure apparatus including the photomask |
摘要 |
A near-field photomask includes a light shield film having openings to constitute a light shield portion. The photomask can be used to expose an exposure target with near-field light generated through the openings. The openings formed in the light shield film include two or more parallel rows of first slit openings each having a width smaller than 100 nm, and two or more parallel rows of second slit openings each having a width smaller than 100 nm, which extend perpendicularly to the rows of first slit openings while interlinking at least two of the rows of first slit openings. A near-field exposure apparatus includes the near-field photomask with a positioning unit and a source for illuminating polarized light parallel to the first slit openings for forming a latent-dot-image on an exposure target only where a second slit opening crosses the light shield portion on the near-field photomask.
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申请公布号 |
US7262828(B2) |
申请公布日期 |
2007.08.28 |
申请号 |
US20030648317 |
申请日期 |
2003.08.27 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KURODA RYO;MIZUTANI NATSUHIKO |
分类号 |
G03B27/54;G03F1/16;B82B3/00;B82Y10/00;B82Y40/00;G03B27/16;G03B27/64;G03F1/00;G03F1/08;G03F1/14;G03F1/68;G03F1/70;G03F7/20;H01L21/027 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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