发明名称 |
Plasma processing device and baffle plate thereof |
摘要 |
A plasma processing device able to positively enhance a process-gas exhaust efficiency in a processing region and restrict plasma leaking. A processing container of a magnetron type parallel plate plasma processing device has a separator for separating the inside of the processing container into a processing region and an exhaust region. The separator has a plurality of gas passage holes to establish communication between the processing region and the exhaust region, and includes a non-conductive member. A conductive member is disposed on a gas passage-side surface facing the gas passage holes. A voltage V is applied by a power supply to the conductive member so that the gas passage-side surface is at a potential higher than that of a processing-region surface.
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申请公布号 |
US2005167052(A1) |
申请公布日期 |
2005.08.04 |
申请号 |
US20040508700 |
申请日期 |
2004.09.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ISHIHARA HIROYUKI;ARAKI YOUICHI;TAKAHASHI TOSHIKI;KUBO TAKUYA;ITO ATSUSHI;ONO YOKO |
分类号 |
H05H1/46;B01J19/08;C23C16/455;C23C16/50;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):C23F1/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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