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发明名称
MONOMER AND POLYMER FOR CHEMICALLY AMPLICATION NEGATIVE PHOTORESIST, AND PHOTORESIST COMPOSITION
摘要
申请公布号
KR100778405(B1)
申请公布日期
2007.11.27
申请号
KR20010071247
申请日期
2001.11.16
申请人
发明人
分类号
G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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