发明名称 Photo-curable resin composition, process for producing the same and products using the same
摘要 The present photo-curable resin composition, at least one of which comprises an organic silicic compound, an epoxy resin and a photo initiator capable of polymerizing the organic silicic compound or epoxy resin upon absorption of actinic ray, undergoes polymerization and curing upon absorption of actinic ray, and is suitably applied to multilayered wiring boards and semiconductor devices because its cured product can maintain a desired modulus of elasticity at temperatures as high as or higher than Tg without any decrease in the bonding strength at elevated temperatures and with less development of cracks or peeling.
申请公布号 US2001039300(A1) 申请公布日期 2001.11.08
申请号 US20010790692 申请日期 2001.02.23
申请人 SUZUKI MASAO;SATSU YUICHI;TAKAHASHI AKIO;NAKAI HARUKAZU;ITO YUZO 发明人 SUZUKI MASAO;SATSU YUICHI;TAKAHASHI AKIO;NAKAI HARUKAZU;ITO YUZO
分类号 C08L63/00;C08G59/14;C08G59/30;C08G59/32;C08G59/40;C08G77/04;C08L83/06;C09J163/00;C09J183/04;G03F7/075;H01B3/40;H01B3/46;H05K3/46;(IPC1-7):C08J3/28;B32B3/00;B32B7/00;B32B15/00;H01L21/31;H01L21/469 主分类号 C08L63/00
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