| 发明名称 |
COPOLYMER AND ITS MANUFACTURING PROCESS |
| 摘要 |
Novel copolymers which can be used as base polymers for high-resolution resists are built up from 40 to 99 mol% of a tertiary butyl ester of an unsaturated carboxylic acid and from 1 to 60 mol% of an anhydride of an unsaturated carboxylic acid. |
| 申请公布号 |
JPH059231(A) |
申请公布日期 |
1993.01.19 |
| 申请号 |
JP19910353046 |
申请日期 |
1991.12.18 |
| 申请人 |
SIEMENS AG |
发明人 |
REKAI ZECHI;HORUSUTO BORUNDERUFUAA;HERUMUUTO AANE;JIIKUFURIITO BIRUKURE;EBAAHARUTO KIYUUN;RAINAA ROISHIYUNAA;EFUA RITSUSERU;MIHIAERU ZEBARUTO |
| 分类号 |
C08F212/32;C08F12/00;C08F220/10;C08F220/18;C08F222/06;G03F7/004;G03F7/027;G03F7/038;G03F7/039;G03F7/26;H01L21/027 |
主分类号 |
C08F212/32 |
| 代理机构 |
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代理人 |
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