CHARGED-PARTICLE BEAM TRANSFER MASK, AND ITS FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of highly mass-productively forming the charged-particle beam transfer mask of a stencil mask structure.

SOLUTION: The method includes a step of laminating and sticking a plurality of support substrate forming thin plates having a through hole in a predetermined shape to form a support substrate 110A. The method further includes (a) a through hole filling step of filling the through hole 160 of the support substrate 110A with the filler of a predetermined material, (b) a flattening step of grinding both surfaces of the substrate 110A to flatten, (c) a thin film layer forming step of forming a thin film layer 170 for forming a thin film pattern layer over the flattened surface, (d) a filler removing step of removing the filler 160 of the support substrate 110A with the thin film layer and the support substrate 110A left by selective etching, and (e) a thin film pattern forming step of machining the thin film layer by a photo-etching method to form the thin film pattern 175.

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