发明名称 |
Semiconductor device |
摘要 |
A semiconductor device includes first metal-on-semiconductor (MOS), second MOS, and bipolar junction (BJ) structures formed in a substrate. The first MOS structure includes first drain, first channel, and first source regions arranged along a first direction. The first MOS structure further includes a drain electrode formed over and conductively coupled to the first drain region, and a body region formed below and conductively coupled to the channel region. The second MOS structure includes second drain, second channel, and second source regions arranged along a second direction different from the first direction. The BJ structure includes emitter, base, and collector regions. The first source region and the second drain region share a first common semiconductor region in the substrate. The drain electrode and the base region share a second common semiconductor region in the substrate. The body region and the collector region share a third common semiconductor region in the substrate. |
申请公布号 |
US9397090(B1) |
申请公布日期 |
2016.07.19 |
申请号 |
US201514683673 |
申请日期 |
2015.04.10 |
申请人 |
Macronix International Co., Ltd. |
发明人 |
Chen Hsin-Liang;Tsai Ying-Chieh;Chan Wing-Chor;Wu Shyi-Yuan |
分类号 |
H01L21/70;H01L27/06;H01L29/78;H01L29/73;H01L29/10;H01L29/08;H01L27/092;H01L27/02 |
主分类号 |
H01L21/70 |
代理机构 |
Finnegan, Henderson, Farabow, Garrett & Dunner LLP |
代理人 |
Finnegan, Henderson, Farabow, Garrett & Dunner LLP |
主权项 |
1. A semiconductor device comprising:
a substrate; a first metal-on-semiconductor (MOS) structure formed in the substrate, the first MOS structure including:
a first drain region, a first channel region, and a first source region arranged along a first direction in this order;a drain electrode formed over and conductively coupled to the first drain region; anda body region formed below and conductively coupled to the channel region; a second MOS structure formed in the substrate, the second MOS structure including a second drain region, a second channel region, and a second source region arranged along a second direction different from the first direction in this order; and a bipolar junction (BJ) structure formed in the substrate, the BJ structure including an emitter region, a base region, and a collector region, wherein:
the first source region and the second drain region share a first common semiconductor region in the substrate,the emitter region is in contact with the drain electrode,the drain electrode and the base region share a second common semiconductor region in the substrate, andthe body region and the collector region share a third common semiconductor region in the substrate. |
地址 |
Hsinchu TW |