| 发明名称 | Acid generator compounds and photoresists comprising same | ||
| 摘要 | Acid generator compounds are provided that are particularly useful as a photoresist composition component. Acid generator compounds of the invention comprise 1) a cyclic sulfonium salt and 2) a covalently linked photoacid-labile group. In one aspect, thioxanthone acid generator compounds are particularly preferred, including acid generator compounds that comprise (i) a thioxanthone moiety; and (ii) one or more covalently linked acid labile-groups. | ||
| 申请公布号 | US9500947(B2) | 申请公布日期 | 2016.11.22 |
| 申请号 | US201314027349 | 申请日期 | 2013.09.16 |
| 申请人 | Rohm and Haas Electronic Materials LLC;Dow Global Technologies LLC | 发明人 | LaBeaume Paul J.;Rachford Aaron A.;Jain Vipul |
| 分类号 | G03F7/004;C07C381/12;G03F7/20;G03F7/038;G03F7/039 | 主分类号 | G03F7/004 |
| 代理机构 | Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. | 代理人 | Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. ;Corless Peter F. |
| 主权项 | 1. A photoresist composition comprising: (a) a polymer; and (b) an acid generator comprising: (i) a thioxanthone moiety; and(ii) one or more covalently linked acid labile-groups, wherein the acid generator exhibits a reduction potential of −0.9 to 0 V (vs. Ag/AgCl, cathodic peak potential) in a standard reduction potential assay. | ||
| 地址 | Marlborough MA US | ||