发明名称 |
HIGH FREQUENCY TRANSISTOR DEVICE WITH ANTIMONY IMPLANTATION AND FABRICATION METHOD THEREOF |
摘要 |
In the fabrication of a transistor device, particularly a low-voltage high-frequency transistor for use in mobile telecommunications, a method for improving the transistor performance and the high-frequency characteristics, comprising the steps of: providing a semiconductor substrate (1) with an n-doped collector layer (5) surrounded by isolation areas (4); implanting antimony ions into said collector layer such that a thin highly n-doped layer (18) is formed in the uppermost portion of said collector layer; and forming a base on top of said thin highly n-doped layer (18). |
申请公布号 |
WO0201623(A1) |
申请公布日期 |
2002.01.03 |
申请号 |
WO2001SE01385 |
申请日期 |
2001.06.19 |
申请人 |
TELEFONAKTIEBOLAGET LM ERICSSON |
发明人 |
NORSTROEM, HANS;ARNBORG, TORKEL;JOHANSSON, TED |
分类号 |
H01L21/331;H01L29/08;H01L29/737;(IPC1-7):H01L21/331;H01L29/732 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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