发明名称 |
APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME |
摘要 |
An apparatus for manufacturing a semiconductor includes a polyhedral transfer chamber, a first process module for forming a gate dielectric layer by ALD, and a second process module for thermally treating the gate dielectric layer. The first process module is in communication with a first side of the transfer chamber. The second process module in communication with a second side of the transfer chamber. The apparatus further includes at least one load-lock chamber in communication with a third side of the transfer chamber.
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申请公布号 |
US2006223308(A1) |
申请公布日期 |
2006.10.05 |
申请号 |
US20060421672 |
申请日期 |
2006.06.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOU YOUNG-SUB;KIM JAE-WOONG |
分类号 |
H01L21/205;H01L21/4763;H01L21/00;H01L21/28;H01L21/314;H01L21/3205;H01L21/44 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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