| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure system capable of preventing a pattern image which is projected on a substrate from being deteriorated by liquid pressure variations or the like. SOLUTION: An exposure system EX comprises a channel forming member 70 provided to surround the side surface 2T of an optical element 2 which is in contact with a liquid LQ, among a plurality of optical members comprising an optical projection system PL, and including a liquid inlet 13 and a liquid recovery port 23; and regulates a pressure of the liquid LQ in an immersion area AR2, so that a gap between the side surface 2T of the optical element 2 and the channel forming member 70 is not immersed with the liquid LQ more than a predetermined height. COPYRIGHT: (C)2005,JPO&NCIPI
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