| 摘要 |
<p>In a pattern inspection device, detect signals which are nearly simultaneously obtained from identical circuit patterns are compared with each other by arranging three or more electrooptic systems. In addition, the areas near a plurality of electron sources are characterized by always maintaining it at high degrees of vacuum by evacuating an electron gun chamber mounted with a plurality of electron sources independently from a sample chamber. In addition, electric fields and magnetic fields are confined in each electrooptic system by means of a shielded electrode which can evacuate an electron beam passage to a high degree of vacuum and, at the same time, secondary electrons or reflected electrons are detected in the same optical system by accelerating the secondary electrons or reflected electrons toward the electron sources in the axial direction of the electron beam by setting a sample to a negative voltage. Therefore, the defect discrimination of pattern inspections can be performed simultaneously and, at the same time, the throughput of the inspections can be improved in proportion to the number of the electrooptic systems. Moreover, three or more electron sources can be operated stably in high-vacuum states and, at the same time, accurate inspections can be carried out by detecting signals from the closely arranged electrooptic systems with high accuracy.</p> |
