发明名称 |
SN PLATING MATERIAL AND METHOD FOR PRODUCING SAME |
摘要 |
Provided are an Sn plating material having superior micro slide-movement abrasion resistance when being used as a material for insertable/removable connection terminals and the like, and a method for producing the Sn plating material. On a base material 10 formed of copper or a copper alloy, a Ni layer 16 is formed so as to have a thickness of 0.1-1.5 µm through electroplating, a Sn-Cu plating layer 12 in which a Cu-Sn alloy 12a and a Sn 12b are intermixed is formed so as to have a thickness of 0.6-10 µm through electroplating using a Sn-Cu plating bath in which the Cu content with respect to the total of Sn and Cu is 5-35 mass%, and then, if necessary, a Sn layer 14 is formed through electroplating so as to have a thickness not larger than 1 µm. |
申请公布号 |
WO2016178305(A1) |
申请公布日期 |
2016.11.10 |
申请号 |
WO2016JP02103 |
申请日期 |
2016.04.20 |
申请人 |
DOWA METALTECH CO., LTD.;YAZAKI CORPORATION |
发明人 |
KOTANI, Hirotaka;NARIEDA, Hiroto;ENDO, Hideki;SUGAWARA, Akira;SONODA, Yuta;KONDO, Takaya;TOYOIZUMI, Jyun;KISHIBATA, Yuya |
分类号 |
C25D5/10;C25D5/12;C25D7/00;H01R13/03 |
主分类号 |
C25D5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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