| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composite to be used in liquid immersion processes that is improved in PEB temperature dependency and liquid immersion soaking in liquid immersion exposure, and a pattern forming method using it. <P>SOLUTION: This chemically amplified resist composite contains (A) resin which is decomposed by acid and becomes more soluble to an alkali developer, (B) a compound which generates acid when irradiated with active light or a radioactive ray, (C) a solvent, and (D) 1,000 ppm or more of a surfactant of a fluorine and/or a silicon systems. The pattern forming method uses this composite. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
