| 摘要 |
<P>PROBLEM TO BE SOLVED: To decrease an outgas partial pressure in a projection optical system space in an aligner using an extreme ultraviolet light and to prevent a reduction of reflection factor of a projection optical system mirror. <P>SOLUTION: The aligner has: a chamber surrounding a space 18 enclosing at least part of projection optical systems 2 to 7 for projecting light from an original form 11 into a substrate 22; an exhaust means 31 to 34 for exhausting the space; and a supply means 41 for supplying a gas into the space, and exposes the substrate through the original form and the projection optical systems. A control means 42 is provided for controlling a flow rate of the gas which is supplied into the space by the supply means to be in a range of 0.05 to 50 Pa m<SP>3</SP>/s. <P>COPYRIGHT: (C)2008,JPO&INPIT |
