ARC SUPPRESSION AND PULSING IN HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS)

摘要

An apparatus for generating sputtering of a target to produce a coating on a substrate is provided. The apparatus has a magnetron including a cathode and an anode. A power supply is operably connected to the magnetron and at least one capacitor is operably connected to the power supply. The apparatus also includes an inductance operably connected to the at least one capacitor. A first switch and a second switch are also provided. The first switch operably connects the power supply to the magnetron to charge the magnetron and the first switch is configured to charge the magnetron according to a first pulse. The second switch is operably connected to discharge the magnetron. The second switch is configured to discharge the magnetron according to a second pulse.

主权项

1. A method of sputter coating a substrate or of manufacturing a sputter coated substrate comprising:
Providing a magnetron sputter source Exposing a substrate to said magnetron Supplying said magnetron by a power supply Providing at least one capacitor operatively connected to said power supply Providing an inductance of 0.1 to 100 μH operatively connected to said capacitance and in series with said power supply and said magnetron Administering a first pulse to said inductance with a duty cycle of 0.1% to 10%, said administering including first pulsed closing a first switch connecting said inductance to said power supply Establishing discharge of said magnetron, including second pulsed opening of a second switch.