LASER EXPOSURE METHOD-BASED MICROPATTERN MANUFACTURING DEVICE AND MANUFACTURING SYSTEM ENABLING FOCAL DEPTH ADJUSTMENT AND DIFFRACTIVE ELEMENT MANUFACTURED BY THE MANUFACTURING SYSTEM

摘要

The present invention relates to a laser exposure method-based micropattern manufacturing device enabling focal depth adjustment. More specifically, the present invention relates to a micropattern manufacturing device which comprises a height-direction interference formation unit, thereby interfering laser beams having different plane-direction widths from each other and injecting, in a photoresist, an interference laser beam having an interference pattern direction in the height direction, thereby enabling the improvement of height-direction line width, and further, a deformation mirror which is possible of curvature deformation is applied, thus enabling the adjustment of focal depth, thereby enabling the manufacturing of a triangular patterned diffractive element.