| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method capable of preventing the remaining of a liquid on a substrate stage and maintaining an excellent exposure accuracy. SOLUTION: An aligner EX has a mask stage MST supporting a mask M, the substrate stage PST supporting a substrate P and an illumination optical system IL illuminating the mask M supported by the mask stage MST by an exposure light EL. The aligner EX further has a projection optical system PL projecting and exposing a pattern image on the mask M illuminated by the exposure light EL on the substrate P supported to the substrate stage PST, a controller CONT collectively controlling the operation of the whole of the aligner EX, and a storage device MRY which is connected to the controller CONT and in which various informations related to an exposure treatment are stored. The aligner EX further has a limiter 70 limiting the passage of at least a part of the exposure light EL, and the outside of the substrate P is not irradiated with the exposure light EL during the exposure of the substrate P. COPYRIGHT: (C)2005,JPO&NCIPI
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