| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound, a resin, and a resist composition capable of producing a resist pattern with few defects and good line edge roughness.SOLUTION: The compound is represented by formula (I), the resin contains a structural unit derived from the compound, and the resist composition contains the resin. [Ris a hydrogen atom, a halogen atom, or a 1-6C alkyl group which may have a halogen atom; Ris a group having a 5-18C alicyclic hydrocarbon group; Rfand Rfare each independently a 1-4C perfluoroalkyl group; Ais a single bond, a 1-6C alkanediyl group, or-A-X-(A-X)-(A)-; * is a bond with an oxygen atom; Ato Aare each independently a 1-6C alkanediyl group; Xand Xare each independently -O-, -CO-O-, or -O-CO-; and a and b are each 0 or 1.]SELECTED DRAWING: None |
