| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor depositing material capable of obtaining a vapor deposition film in which the material high in vapor pressure is rich in the compsn. in the initial stage of the vapor deposition and the material low in vapor pressure is rich in the compsn. in the terminal stage of the vapor deposition by one time vapor depositing operation. SOLUTION: This material has a composite structure provided with an aluminum substrate 1 and metallic particles 2 dispersed into the axial region 4 of the aluminum substrate, in which the aluminum substrate is composed of metal of high vapor pressure, and the metallic particles are composed of metal of low vapor pressure, and the metallic particles are composed of at least one material selected from chromium, cobalt, molybdenum, manganese, niobium, tantalum, tungsten, beryllium, nickel, tin, iron, lead, silicon, titanium, vanadium, platinum and carbon.
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