发明名称 Process for producing a purified aqueous hydrogen peroxide solution
摘要 <p>The present invention provides a process for producing a highly purified aqueous hydrogen peroxide solution from which silicon oxide impurities are removed to a minimum by purifying an aqueous hydrogen peroxide solution containing silicon oxide impurities. &lt;??&gt;The present invention comprises a process for producing a purified aqueous hydrogen peroxide solution by removing silicon oxide impurities contained in an aqueous hydrogen peroxide solution, which comprises: adding a flocculating agent to an aqueous hydrogen peroxide solution containing silicon oxide impurities, and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the aqueous hydrogen peroxide solution obtained as above into contact with an anion exchange resin in a fluoride ion form by at least one fluoride compound which contains 0.05 % by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride.</p>
申请公布号 EP1167289(A2) 申请公布日期 2002.01.02
申请号 EP20010303974 申请日期 2001.04.30
申请人 SANTOKU CHEMICAL INDUSTRIES CO., LTD. 发明人 TANAKA, FUJIO;ADACHI, TAKASHI;MINE, KAZUHISA;KIMURA, KAZUYA
分类号 B01D21/01;B01D61/14;B01J39/04;B01J41/04;B01J49/00;C01B15/013;C02F1/42;C02F1/44;C02F1/52;(IPC1-7):C01B15/013 主分类号 B01D21/01
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