发明名称 |
Process for producing a purified aqueous hydrogen peroxide solution |
摘要 |
<p>The present invention provides a process for producing a highly purified aqueous hydrogen peroxide solution from which silicon oxide impurities are removed to a minimum by purifying an aqueous hydrogen peroxide solution containing silicon oxide impurities. <??>The present invention comprises a process for producing a purified aqueous hydrogen peroxide solution by removing silicon oxide impurities contained in an aqueous hydrogen peroxide solution, which comprises: adding a flocculating agent to an aqueous hydrogen peroxide solution containing silicon oxide impurities, and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the aqueous hydrogen peroxide solution obtained as above into contact with an anion exchange resin in a fluoride ion form by at least one fluoride compound which contains 0.05 % by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride.</p> |
申请公布号 |
EP1167289(A2) |
申请公布日期 |
2002.01.02 |
申请号 |
EP20010303974 |
申请日期 |
2001.04.30 |
申请人 |
SANTOKU CHEMICAL INDUSTRIES CO., LTD. |
发明人 |
TANAKA, FUJIO;ADACHI, TAKASHI;MINE, KAZUHISA;KIMURA, KAZUYA |
分类号 |
B01D21/01;B01D61/14;B01J39/04;B01J41/04;B01J49/00;C01B15/013;C02F1/42;C02F1/44;C02F1/52;(IPC1-7):C01B15/013 |
主分类号 |
B01D21/01 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|