发明名称 |
HIGH SILICON-CONTENT THIN FILM THERMOSETS |
摘要 |
High silicon-content resin composition that can be used to form thin film thermosets, useful in forming low k dielectric constant materials and as well as hard mask materials with anti-reflective properties for the photolithography industry are disclosed.
|
申请公布号 |
KR20090028514(A) |
申请公布日期 |
2009.03.18 |
申请号 |
KR20087029521 |
申请日期 |
2008.12.02 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
ABDALLAH DAVID J.;ZHANG RUZHI |
分类号 |
C08L83/04;C08K5/02;C09D183/04;G03F7/09 |
主分类号 |
C08L83/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|