| 摘要 |
PROBLEM TO BE SOLVED: To protect a transfer pattern of a photomask by preventing reliably contact of a photomask with a to-be-processed object or impingement of the photomask on the object without impairing productivity even when the clearance between the photomask and the object is narrowed in forming a pattern on the object by proximity exposure.SOLUTION: A method of producing a processed body includes a pattern formation step of arranging a photomask having a transfer pattern and a to-be-processed object having a pattern formation surface in proximity in such a manner that the transfer pattern and the pattern formation surface face each other and carrying out proximity exposure by using a photomask so as to form a pattern on the pattern formation surface by photo-lithography. A protrusion is formed convexly in an area including the transfer pattern of the photomask, and the whole length of the protrusion in the optical axis direction of the exposure light is smaller than the clearance between the arrangement surface of the protrusion and the pattern formation surface facing each other. In the pattern formation step, a clearance intervenes between the tip of the protrusion and the pattern formation surface. A photomask is also provided. |
