MANUFACTURING METHOD OF COLOR FILTER

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter by which an exposure defect pattern due to light interference hardly occurs in a region of a gradation mask where a semitransparent region and a transmissive region adjoin each other.

SOLUTION: The manufacturing method of the color filter uses the gradation mask which has: a transparent substrate; a semitransparent film formed in a pattern shape on the transparent substrate; the transmissive region where the transparent substrate is exposed; a semitransparent region where the semitransparent film is provided on the transparent substrate; and a pattern where the transmissive region and the semitransparent region adjoin each other, and in which when simulation of light intensity distribution at the time of exposure using the gradation mark is performed, light intensity monotonously decreases from the transmissive region toward the semitransparent region in a region within 5 μm distance from a boundary between the transmissive region and the semitransparent region and there is no inflection point in the light intensity distribution.

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