| 发明名称 |
RADIATION-SENSITIVE POSITIVE RESIST COMPOSITION |
| 摘要 |
A positive resist composition comprising an alkali-soluble resin, a quinonediazide compound and a solvent comprising 3-methoxybutyl acetate, which forms a resist film having smaller striation.
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| 申请公布号 |
CA2027368(A1) |
申请公布日期 |
1991.04.14 |
| 申请号 |
CA19902027368 |
申请日期 |
1990.10.11 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
TAKAHASHI, KENJI;HANAMOTO, YUKIO;OSAKI, HARUYOSHI |
| 分类号 |
G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/22;G03F7/38 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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