发明名称 RESIN COMPOSITION SENSITIVE TO UV RADIATION AND TO ELECTRONS
摘要 <p>The composition comprises a polymeric base and a photosensitizer dissolved in an organic solvent, the polymeric base including at least one polymeric base including at least one polymer or copolymer having a base unit of the formula (I), wherein A is H or a chemical bond; R1 is -CH2-, (a), (b), with R being H or an alkyl radical; R2 is H or OH; R3 is H or an alkyl radical and Z is a halogen, a halogenomethyl, or -O-Y wherein Y is -CH2-CH=CH2, (c), (d) or (e), with the proviso that when R1 is -CH2-, R2 is OH and R3 is an alkyl radical, Z is different from a halogen.</p>
申请公布号 WO1990015363(A1) 申请公布日期 1990.12.13
申请号 FR1990000373 申请日期 1990.05.29
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