| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner which can accurately and easily obtain such operational information that is considered to be sufficient from the view point of the maintenance and management of the aligner and, when the maintenance is performed, can be maintained and managed accurately with high convenience. SOLUTION: This aligner which exposes a wafer W by using exposing light EL is provided with a nonvolatile storage device 50 which stores the operational information on the exposure system. The operational information includes the number of transported wafers W, the number of exposed wafers W, the number of exposure performing times, the used time of reticles (20a-20d), etc. In addition, a threshold which is used for discriminating the necessity of maintenance work is set in a main control system 42 which issues an alarm indicating the necessity of the maintenance work to a CRT 68 when the operational information exceeds the threshold. When the control system 42 issues the alarm, the system 42 stops the operation of the aligner. |
