发明名称 TRANSFER SYSTEM, EXPOSURE APPARATUS, TRANSFER METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUCTION APPARATUS
摘要 A carrier system is provided with a wafer stage (WST) which holds a mounted wafer (W) and is also movable along an XY plane, a chuck unit (153) which holds the wafer from above in a non-contact manner above a predetermined position and is vertically movable, and a plurality of vertical movement pins (140), which can support from below the wafer held by the chuck unit (153) on the wafer stage (WST) when the wafer stage (WST) is positioned at the predetermined position above and can also move vertically. Then, flatness of the wafer (W) is measured by a Z position detection system (146), and based on the measurement results, the chuck unit(153) and the vertical movement pins (140) that hold (support) the wafer (W) are independently driven.
申请公布号 HK1216357(A1) 申请公布日期 2016.11.04
申请号 HK20160104043 申请日期 2016.04.08
申请人 NIKON CORPORATION 发明人 HARA, HIDEAKI
分类号 H01L;G03F 主分类号 H01L
代理机构 代理人
主权项
地址