Semiconductor device with layout of wiring layer and dummy patterns

摘要

A method of layout of pattern includes the following processes. A graphic data of a first wiring in a first area of a semiconductor wafer is extracted. The first area is a semiconductor chip forming area. The first area is surrounded by a scribed area of the semiconductor wafer. The first area includes a second area. The second area is bounded with the scribed area. The second area has a second distance from a boundary between the semiconductor chip forming area and the scribed area to an boundary between the first area and the second area. A first dummy pattern in the first area is laid out. The first dummy pattern has at least a first distance from the first wiring. A second dummy pattern in the second area is laid out. The second dummy pattern has at least the first distance from the first wiring. The second dummy pattern has at least a third distance from the first dummy pattern.

主权项

1. A semiconductor device, comprising:
a semiconductor substrate; a wiring layer formed over the semiconductor substrate and extending in a first direction from a top view; a first plurality of first dummy patterns arranged in a line extending in the first direction, the first plurality of first dummy patterns being disposed in a same layer as the wiring layer, each of the first plurality of first dummy patterns having a first length in the first direction and a first width in a second direction perpendicular to the first direction, and having a substantially square shape; and a second dummy pattern placed between the wiring layer and the first plurality of first dummy patterns, the second dummy pattern being disposed in a same layer as the wiring layer and comprising a first portion extending in the first direction, the first portion having a second length greater than the first length in the first direction, and a second width in the second direction, wherein the first dummy patterns have a shape different from a shape of the second dummy pattern.