ARRAY SUBSTRATE, ITS MANUFACTURING METHOD AND DISPLAY DEVICE

摘要

The present disclosure provides an array substrate, its manufacturing method and a display device. The array substrate includes a thin film transistor. A source electrode and a drain electrode are located above a pattern of an active layer, and the source electrode and the drain electrode are in electrical contact with the pattern of the active layer through a first via-hole penetrating an insulating structure. Before the formation of the source electrode and the drain electrode, the pattern of the active layer is subjected to ion injection through the first via-hole, so as to form an ion injection region.

主权项

1. A method for manufacturing an array substrate, comprising a step of forming a thin film transistor (TFT); wherein the step of forming the TFT comprises:
forming a pattern of an active layer on a substrate; forming an insulating structure on the pattern of the active layer; forming a first via-hole penetrating the insulating structure so as to expose the pattern of the active layer at a position corresponding to the first via-hole, the first via-hole extending to an interior of the exposed pattern of the active layer; subjecting the exposed pattern of the active layer to ion injection through the first via-hole, so as to form an ion injection region located in pattern of the active layer; and forming a source electrode and a drain electrode on the insulating structure, the source electrode and the drain electrode being in contact with a surface of the ion injection region through the first via-hole so as to be electrically connected to the pattern of the active layer.