| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem wherein the mask error factor (MEF) of an obtained resist pattern is not necessarily sufficiently satisfactory, concerning a resist composition containing an acid generating agent which is well-known hitherto.SOLUTION: This salt is represented by formula (I). [In the formula, Rand Reach independently represent a fluorine atom or a 1-6C perfluoroalkyl group. Xrepresents a divalent 1-17C saturated hydrocarbon group, wherein a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, and -CH- constituting the saturated hydrocarbon group may be substituted with -O- or -CO-. Zrepresents organic counter ion]. |
