| 发明名称 | Lithographically produced features | ||
| 摘要 | The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block. | ||
| 申请公布号 | US9606440(B2) | 申请公布日期 | 2017.03.28 |
| 申请号 | US201414770340 | 申请日期 | 2014.02.25 |
| 申请人 | THE UNIVERSITY OF QUEENSLAND | 发明人 | Blakey Idriss;Chuang Ya-Mi;Whittaker Andrew Keith;Jack Kevin Stanley |
| 分类号 | G03F7/004;G03F7/40;C08G61/12;C09D153/00;C08L53/00;C08F293/00;G03F7/00;G03F7/09 | 主分类号 | G03F7/004 |
| 代理机构 | Nixon & Vanderhye P.C. | 代理人 | Nixon & Vanderhye P.C. |
| 主权项 | 1. A method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block. | ||
| 地址 | St. Lucia, Queensland AU | ||