发明名称 |
Enclosure, device and process for annealing a II-IV semiconductor material |
摘要 |
The chamber (7) has a storage zone (8) for storing an element of group II of periodic table i.e. liquid mercury, a receiving zone (9) for receiving semi-conductor material of II-VI type, and a separating partition (12) provided at the level of an intermediate zone (13). The separating partition has passage aperture (14) that is equipped with an anti-reverse gas flow unit i.e. ball type anti-return valve (15), to ensure one-way passage of the liquid mercury, in vapor phase, from the storage zone to the receiving zone. A thermal insulator (16) is provided at the level of the intermediate zone. Independent claims are also included for the following: (1) a device for annealing II-VI type semi-conductor material, comprising an annealing chamber (2) a method for annealing II-VI type semi-conductor material. |
申请公布号 |
EP2256784(A3) |
申请公布日期 |
2017.03.22 |
申请号 |
EP20100354022 |
申请日期 |
2010.05.18 |
申请人 |
Commissariat à l'Énergie Atomique et aux Énergies Alternatives |
发明人 |
Mollard, Laurent;Bourgeois, Guillaume;Henry, Franck;Pelliciari, Bernard |
分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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