PLASMA COATING METHOD FOR DEPOSITING A FUNCTIONAL LAYER, AND DEPOSITING DEVICE

摘要

The invention relates to a plasma coating method for depositing a functional layer on a surface of a substrate and to a device for carrying out the coating method. The aim of the invention is to provide a plasma coating method which allows high coating speeds and is carried out under normal atmospheric conditions. According to the invention, this is achieved in that an atmospheric plasma and an inert carrier gas are used so that very high energies can be introduced into the coating material in order to start a chemical reaction, and a controllable chemical reaction is allowed while excluding atmospheric oxygen in the plasma. The coating material for forming the functional layer is supplied directly into the plasma, which is generated in a nozzle, via a supply line while excluding oxygen.