发明名称 PROCESS MONITORING SYSTEM IN SEMICONDUCTOR PRODUCING PROCESS
摘要 The present invention relates to a manufacturing process monitoring system in a semiconductor manufacturing process. The process monitoring system comprises: a semiconductor process apparatus; an image acquisition apparatus installed in the semiconductor process apparatus so as to acquire first and second image data, which are low resolution and high resolution respectively; and a managing server including a memory storing standard image data, and generating error information by comparing the second image data to the standard image data. According to the present invention, if an error occurs, a user is able to conveniently check a situation when the error occurs through a video, thereby helping the user to take an appropriate measure.
申请公布号 KR101619097(B1) 申请公布日期 2016.05.18
申请号 KR20150115231 申请日期 2015.08.17
申请人 MSV CO., LTD. 发明人 YOON, GIL JUNG;LEE, CHEOL HO
分类号 H01L21/66 主分类号 H01L21/66
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