METHOD FOR PRODUCING PATTERN FORMATION BODY, PATTERN FORMATION BODY AND LIGHT IRRADIATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a pattern formation body capable of suppressing the generation amount of active oxygen during irradiation with vacuum ultraviolet rays and precisely forming a pattern accurately following a mask pattern, and to provide a pattern formation body and a light irradiation apparatus.SOLUTION: There is provided a light irradiation apparatus 100 which comprises: a mask which is arranged spaced apart from a pattern forming substrate and on which a predetermined pattern is formed; a vacuum ultraviolet ray source unit for irradiating the pattern forming substrate with light including vacuum ultraviolet ray via the mask; and a surrounding member for surrounding an optical path of the light from the vacuum ultraviolet ray source unit to the mask. The interior of the surrounding member is purged with inert gas and the space between the mask and the pattern forming substrate is an oxygen reduced atmosphere having an oxygen partial pressure lower than atmospheric pressure.SELECTED DRAWING: Figure 1