发明名称 CHEMICALLY AMPLIFIED NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM AND PRODUCTION METHOD OF THE SAME, PATTERN FORMING METHOD, AND PROTECTIVE FILM FOR ELECTRIC/ELECTRONIC COMPONENT
摘要 PROBLEM TO BE SOLVED: To provide a resist material that can be easily patterned and gives a film excellent in various film characteristics, particularly in adhesiveness to a substrate used for a circuit board, and excellent in reliability as an electric/electronic component, particularly in alkali resistance, and a protective film for an electric/electronic component having high reliability.SOLUTION: A chemically amplified negative resist material is provided, which comprises (A) a silicone skeleton-containing polymeric compound having a repeating unit of formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a polyhydric phenolic compound, (C) a photoacid generator, and (D) a solvent.SELECTED DRAWING: None
申请公布号 JP2016071355(A) 申请公布日期 2016.05.09
申请号 JP20150178063 申请日期 2015.09.10
申请人 SHIN ETSU CHEM CO LTD 发明人 ASAI SATOSHI;TAKEMURA KATSUYA;SOGA KYOKO
分类号 G03F7/075;C08G59/20;G03F7/004;G03F7/038;G03F7/20;G03F7/40;H05K3/28 主分类号 G03F7/075
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