发明名称 Implantation Tools for Interspinous Process Spacing Device
摘要 Various embodiments described herein provide interspinous process spacing devices and related systems and methods. In one embodiment, surgical instrument system for implanting an interspinous process spacing device includes a first arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a first engagement element configured for releasably engaging a first attachment side of an interspinous process spacing device. The system also includes a second arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a second engagement element configured for releasably engaging a second attachment side of the interspinous process spacing device. The first arm and the second arm are removably attachable to one another via attachment elements and are configured for aligning a spacer of the first attachment side and a spacer opening of the second attachment side.
申请公布号 US2016113689(A1) 申请公布日期 2016.04.28
申请号 US201614986914 申请日期 2016.01.04
申请人 Southern Spine, LLC 发明人 Smisson, III Hugh F.;Field David C.;Bohleber Brandi L.;Yilma Hiywot;Cowan Michael A.
分类号 A61B17/70;A61B90/00 主分类号 A61B17/70
代理机构 代理人
主权项 1. A surgical instrument for implanting an interspinous process spacing device comprising a first attachment side having a spacer and a second attachment side having a spacer opening configured to receive the spacer, the surgical instrument comprising: a first arm comprising a proximal end, an elongated central portion, and a distal end, wherein the distal end of the first arm comprises a first engagement projection configured for releasably engaging the first attachment side of the interspinous process spacing device; and a second arm comprising a proximal end, an elongated central portion, and a distal end, wherein the distal end of the second arm comprises a mount and a second engagement projection movably attached to the mount and configured for releasably engaging the second attachment side of the interspinous process spacing device; wherein the first arm and the second arm are pivotally attached to one another and are configured for advancing the first attachment side and the second attachment side toward one another.
地址 Macon GA US
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