| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having excellent line edge roughness (LER) and fewer defects can be produced.SOLUTION: The resist composition includes: (A1) a resin having a structural unit expressed by formula (I); (A2) a resin which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; (B) an acid generator; and (D) a compound expressed by formula (II). In the formulae, Rrepresents a hydrogen atom or a methyl group; Arepresents -(CH)-, -(CH)-O-(CH)- or -(CH)-CO-O-(CH), where m1 to m5 each independently represent an integer of 1 to 6; and Rrepresents a hydrocarbon group including a fluorine atom. |
