发明名称 レーザ加工装置およびレーザ加工方法
摘要 PURPOSE: A laser processing device and a laser processing method are provided to prevent a short by removing a thin film without causing damage to an insulating layer. CONSTITUTION: A thin film of a light furnace is removed by a pulse laser in order to leave a part of the thin film in a thickness direction. The light furnace corrects the defect of a line. The pulse laser removes an insulating layer (72). The insulating layer is formed between the thin film and the line. A continuous wave (CW) laser removes the part of the thin film.
申请公布号 JP5853336(B2) 申请公布日期 2016.02.09
申请号 JP20120039755 申请日期 2012.02.27
申请人 株式会社ブイ・テクノロジー 发明人 山本 正弘
分类号 G02F1/13;B23K26/00;B23K26/36 主分类号 G02F1/13
代理机构 代理人
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