| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus advantageous in achieving both of overlap accuracy and line width accuracy.SOLUTION: Provided is a lithographic apparatus which sequentially irradiates a first region and a second region with beams, respectively to form a pattern thereon. This apparatus includes: a beam detection part which detects beams; and a processing part which obtains positional information on the second region by giving weight onto first positional information on the second region based on output of the beam detection part before irradiating the first region with the beams, and second positional information on the second region based on output of the beam detection part after irradiation, respectively. |
