| 发明名称 |
EPOXY AND ALKOXY SILYL GROUP-CONTAINING SILSESQUIOXANE AND COMPOSITION THEREOF |
| 摘要 |
A silicon compound is described, being obtained by a hydrosilylation reaction of the following compound (a), compound (b) and compound (c). Compound (a) is a silsesquioxane derivative having two or more SiH in one molecule. Compound (b) is a compound having, in one molecule, epoxy and/or oxetanyl and an alkenyl having a carbon number of 2 to 18. Compound (c) is a compound having, in one molecule, an alkoxysilyl and an alkenyl having a carbon number of 2 to 18. |
| 申请公布号 |
US2015368397(A1) |
申请公布日期 |
2015.12.24 |
| 申请号 |
US201314428969 |
申请日期 |
2013.09.17 |
| 申请人 |
JNC CORPORATION |
发明人 |
SUWA KAZUYA;MINEO RYOTA;OOBA TOMOYUKI |
| 分类号 |
C08G65/22;H01L33/56;C09K11/77;C07F7/08;C09D171/00 |
主分类号 |
C08G65/22 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A silicon compound obtained by a hydrosilylation reaction of a compound (a), a compound (b) and a compound (c), wherein
the compound (a) is a silsesquioxane derivative having two or more SiH in one molecule, the compound (b) is a compound having, in one molecule, epoxy and/or oxetanyl and an alkenyl having a carbon number of 2 to 18, and the compound (c) is a compound having, in one molecule, alkoxysilyl and alkenyl having a carbon number of 2 to 18. |
| 地址 |
Tokyo JP |
