发明名称 GAS-INSULATED EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide gas-insulated equipment excellent in direct-current withstand voltage characteristics and compactness, favorable in resistance to insulating cracked gas, resistant to the adhesion of metallic foreign matter, and reliable by forming a film that can discharge residual direct-current voltage on the surface of an insulating spacer to make it possible to easily and reliably control the resistivity distribution of the insulating spacer. <P>SOLUTION: A diamond-like carbon film 5, 1E9 to 1E12Ωcm in resistivity and 10 to 100μm in thickness, is formed on the surface of an insulating spacer 4 by coating. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010022081(A) 申请公布日期 2010.01.28
申请号 JP20080177833 申请日期 2008.07.08
申请人 TOSHIBA CORP 发明人 KOYAMA HIROSHI;HANAI MASAHIRO;KOSAKATA MASAYUKI
分类号 H02G5/06;H02B13/02;H02B13/055 主分类号 H02G5/06
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