发明名称 PLANAR LIGHTING SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a planar lighting system capable of restraining and improving the generation of luminance unevenness around a light-incident part even if the size of a light-irradiating face of a light guide plate is enlarged. <P>SOLUTION: The planar lighting system is provided with a light guide plate having a light-irradiating face, a pair of light-incident faces formed at both end sides of the light-irradiating face, a pair of side faces formed at the other end side of the light-irradiating face, and a rear face formed at the opposite side of the light-irradiating face, slanted so as to be thicker in a direction vertical to the light-irradiating face gradually toward the center of the light-irradiating face from each light-incident face, and composed of a pair of slanted faces jointed between the first light-incident faces, and a pair of main light sources arranged in opposition to each light-incident face. The light guide plate is formed no that scattered particles for scattering light are kneaded and dispersed with a density Npi of the scattered particles in a space area within a given range of the light guide plate directing toward the center of the light guide plate from the light-incident face and a density Np of the scattered particles in the other space area of the light guide plate satisfying Npi>Np. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009087767(A) 申请公布日期 2009.04.23
申请号 JP20070256648 申请日期 2007.09.28
申请人 FUJIFILM CORP 发明人 IWASAKI OSAMU;KATSUMOTO RYUICHI
分类号 F21V8/00;F21Y101/02;G02B5/02;G02B6/00;G02F1/13357 主分类号 F21V8/00
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