PATTERN FORMING METHOD, PATTERN FORMING APPARATUS, NANO-IMPRINT MOLD, AND METHOD OF MANUFACTURING NANO-IMPRINT MOLD

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method etc., that prevents a resin layer and a nano-imprint mold from being broken when the nano-imprint mold is released from the resin layer, the resin layer being made of a photocurable resin. SOLUTION: The pattern forming method by nano-imprinting is characterized by: forming the resin layer of the photocurable resin on a base; pressing the mold having an uneven pattern portion against the resin layer; irradiating the resin layer with light so that the amount of irradiation with the light increases toward an outer periphery of the mold; and releasing the mold from the resin layer after irradiating the resin layer with the light. COPYRIGHT: (C)2011,JPO&INPIT