发明名称 |
Method and System for Uniformly Applying a Multi-Phase Cleaning Solution to a Substrate |
摘要 |
An apparatus used to supply a force onto a cleaning solution for processing a substrate for cleaning surface contaminants is disclosed. The apparatus includes a force applicator and a gate. The force applicator is configured to be adjusted to a first height to off the surface of the substrate. The gate is positioned adjacent to a trailing point of the force applicator and is configured to be adjusted to a second height off of the surface of the substrate to enable planarization of the cleaning solution as the solution moves to the trailing point.
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申请公布号 |
US2011132400(A1) |
申请公布日期 |
2011.06.09 |
申请号 |
US201113028091 |
申请日期 |
2011.02.15 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
FARBER JEFFREY J.;ZHU JI;WOODS CARL;DE LARIOS JOHN M. |
分类号 |
B08B7/00;B08B3/00 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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