| 摘要 |
PROBLEM TO BE SOLVED: To reduce the generation of particles in a stage device.SOLUTION: A stage device where a sample to be processed by an electron beam is mounted and an electron beam device are provided. The stage device includes: an insulating substrate; a chucking electrode that is provided on the insulating substrate; a plurality of support parts that are formed of a conductive material on a surface of the insulating substrate and support the sample; and a support part potential control unit that controls the potentials of the plurality of support parts. The electron beam device includes: the stage device; and an irradiation unit that irradiates the sample with an electron beam. |
