发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which makes it difficult for voids to generate and which can achieve high reliability when an insulator film or the like forms even using a metal electrode with little damage to a device serving as a ground in performing wiring connection.SOLUTION: The semiconductor device is formed with a metal electrode which is placed on a surface of a semiconductor element and which is used for electrical connection with the outside. A shape of the cross section perpendicular to the surface of the semiconductor element, of the metal electrode is made into such a protruding shape that the surface of the semiconductor element is made to serve as a bottom surface.
申请公布号 JP2015185783(A) 申请公布日期 2015.10.22
申请号 JP20140062951 申请日期 2014.03.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 ENDO KAZUYO
分类号 H01L21/3205;H01L21/28;H01L21/60;H01L21/768;H01L23/522;H01L29/41 主分类号 H01L21/3205
代理机构 代理人
主权项
地址
您可能感兴趣的专利